A dense layer of silicon carbide (SiC) is created via chemical vapor deposition (CVD).
Article | Conditions for SiC Coating |
---|---|
Max size (mm) | Φ1050x830H |
Thickness of SiC layer(μm) | 120±30 |
Metal impurities content(mass ppm) ※by GDMS method |
B:0.15 / Na:0.02Al:0.01 / Cr: <0.1Fe:0.02 / <0.01 |
Pyrolytic carbon is coated via chemical vapor deposition (CVD).
Glasslike carbon impregnates or covers the substrate.
Technology developed utilizing Toyo Tanso's isotropic graphite manufacturing technology and silicon carbide (SiC) research results.